Invention Application
- Patent Title: PROCESS FLOW FOR MANUFACTURING SEMICONDUCTOR ON INSULATOR STRUCTURES IN PARALLEL
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Application No.: US15435428Application Date: 2017-02-17
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Publication No.: US20170243781A1Publication Date: 2017-08-24
- Inventor: Igor Peidous , Andrew M. Jones , Srikanth Kommu , Jeffrey L. Libbert
- Applicant: SunEdison Semiconductor Limited (UEN201334164H)
- Main IPC: H01L21/762
- IPC: H01L21/762 ; H01L29/40 ; H01L21/265 ; H01L21/28 ; H01L21/18 ; H01L29/04 ; H01L29/30
Abstract:
A cost effective process flow for manufacturing semiconductor on insulator structures is parallel is provided. Each of the multiple semiconductor-on-insulator composite structures prepared in parallel comprises a charge trapping layer (CTL).
Public/Granted literature
- US09831115B2 Process flow for manufacturing semiconductor on insulator structures in parallel Public/Granted day:2017-11-28
Information query
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