Invention Application
- Patent Title: SUBSTRATE STRUCTURE
-
Application No.: US15258303Application Date: 2016-09-07
-
Publication No.: US20170229386A1Publication Date: 2017-08-10
- Inventor: Fang-Yu Liang , Hung-Hsien Chang , Yi-Che Lai , Wen-Tsung Tseng , Chen-Yu Huang
- Applicant: Siliconware Precision Industries Co., Ltd.
- Priority: TW105104042 20160205
- Main IPC: H01L23/498
- IPC: H01L23/498 ; H01L23/00

Abstract:
A substrate structure is provided, including a substrate body having a conductive pad, an insulation layer formed on the substrate body and exposing the conductive pad, a conductive pillar disposed on the conductive pad, and a metal pad disposed on the insulation layer and electrically connected to the conductive pillar. A conductive component can be coupled to the metal pad. During a high-temperature process, the conductive pillar and the metal pad disperse the remaining stress generated due to heat, thereby preventing the conductive component from being cracked.
Public/Granted literature
- US10049975B2 Substrate structure Public/Granted day:2018-08-14
Information query
IPC分类: