- 专利标题: INTERCONNECTS WITH TRENCHES
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申请号: US14862159申请日: 2015-09-23
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公开(公告)号: US20170086288A1公开(公告)日: 2017-03-23
- 发明人: Gong Ouyang , Shaowu Huang , Kai Xiao
- 申请人: Intel Corporation
- 主分类号: H05K1/02
- IPC分类号: H05K1/02 ; H05K3/46 ; H05K3/30 ; H01P3/08 ; H01P11/00
摘要:
A conductor in a laminar structure, such as a printed circuit board or thin-film stack, is closely flanked by at least one open trench filled with an ambient medium (e.g., air, another gas, vacuum) of a lower dielectric loss than the conductor's surrounding dielectric. The trench may be made by any suitably precise method such as laser scribing, chemical etching or mechanical displacement. A thin layer of dielectric may be left on the sides of the conductor to prevent oxidation or other reactions that may reduce conductivity. When the conductor carries a signal, part of an electric and/or magnetic field that would ordinarily travel through the surrounding dielectric encounters the low-loss ambient medium (e.g. air) in the trench. The effective dielectric loss surrounding the conductor is lowered, reducing signal attenuation and crosstalk, particularly at high frequencies.
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