发明申请
- 专利标题： DUAL-ZONE HEATER FOR PLASMA PROCESSING
- 专利标题（中）： 用于等离子体加工的双区加热器
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申请号： US15009345申请日： 2016-01-28
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公开(公告)号： US20160230281A1公开(公告)日： 2016-08-11
- 发明人: Xing LIN , Jianhua ZHOU , Juan Carlos ROCHA-ALVAREZ , Ramprakash SANKARAKRISHNAN
- 申请人： Applied Materials, Inc.
- 主分类号： C23C16/46
- IPC分类号： C23C16/46 ; H01L21/687 ; H01L21/67 ; C23C16/458 ; H01J37/32
摘要：
A method and apparatus for a pedestal is provided. In one embodiment, the pedestal includes a body comprising a ceramic material having a flange, one or more heating elements embedded in the body, a first shaft coupled to the flange, and a second shaft coupled to the first shaft; wherein the second shaft includes a plurality of fluid channels formed therein that terminate in the second shaft.
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IPC分类:
