Invention Application
- Patent Title: LAMINATE AND CORE SHELL FORMATION OF SILICIDE NANOWIRE
- Patent Title (中): 硅酸盐和核心层形成硅酸盐纳米管
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Application No.: US14975028Application Date: 2015-12-18
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Publication No.: US20160204029A1Publication Date: 2016-07-14
- Inventor: Bencherki MEBARKI , Annamalai LAKSHMANAN , Kaushal K. SINGH , Paul F. MA , Mehul B. NAIK , Andrew COCKBURN , Ludovic GODET
- Applicant: Applied Materials, Inc.
- Main IPC: H01L21/768
- IPC: H01L21/768 ; H01L21/285
Abstract:
Methods and apparatus for forming a metal silicide as nanowires for back-end interconnection structures for semiconductor applications are provided. In one embodiment, the method includes forming a metal silicide stack comprising as plurality of metal silicide layers on a substrate by a chemical vapor deposition process or a physical vapor deposition process, thermal treating the metal silicide stack in a processing chamber, applying a microwave power in the processing chamber while thermal treating the metal silicide layer; and maintaining a substrate temperature less than 400 degrees Celsius while thermal treating the metal silicide layer.
Public/Granted literature
- US10593592B2 Laminate and core shell formation of silicide nanowire Public/Granted day:2020-03-17
Information query
IPC分类:
