Invention Grant
- Patent Title: Laminate and core shell formation of silicide nanowire
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Application No.: US14975028Application Date: 2015-12-18
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Publication No.: US10593592B2Publication Date: 2020-03-17
- Inventor: Bencherki Mebarki , Annamalai Lakshmanan , Kaushal K. Singh , Paul F. Ma , Mehul B. Naik , Andrew Cockburn , Ludovic Godet
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: APPLIED MATERIALS, INC.
- Current Assignee: APPLIED MATERIALS, INC.
- Current Assignee Address: US CA Santa Clara
- Agency: Patterson + Sheridan LLP
- Main IPC: H01L21/768
- IPC: H01L21/768 ; H01L21/285 ; H01L23/532 ; H01L21/3205
Abstract:
Methods and apparatus for forming a metal silicide as nanowires for back-end interconnection structures for semiconductor applications are provided. In one embodiment, the method includes forming a metal silicide stack comprising as plurality of metal silicide layers on a substrate by a chemical vapor deposition process or a physical vapor deposition process, thermal treating the metal silicide stack in a processing chamber, applying a microwave power in the processing chamber while thermal treating the metal silicide layer; and maintaining a substrate temperature less than 400 degrees Celsius while thermal treating the metal silicide layer.
Public/Granted literature
- US20160204029A1 LAMINATE AND CORE SHELL FORMATION OF SILICIDE NANOWIRE Public/Granted day:2016-07-14
Information query
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