Invention Application
US20160027613A1 METHOD AND APPARATUS FOR CONTROLLING A MAGNETIC FIELD IN A PLASMA CHAMBER
有权
用于控制等离子体室中的磁场的方法和装置
- Patent Title: METHOD AND APPARATUS FOR CONTROLLING A MAGNETIC FIELD IN A PLASMA CHAMBER
- Patent Title (中): 用于控制等离子体室中的磁场的方法和装置
-
Application No.: US14339990Application Date: 2014-07-24
-
Publication No.: US20160027613A1Publication Date: 2016-01-28
- Inventor: STEVEN LANE , TZA-JING GUNG , KARTIK RAMASWAMY , TRAVIS KOH , JOSEPH F. AUBUCHON , YANG YANG
- Applicant: APPLIED MATERIALS, INC.
- Main IPC: H01J37/32
- IPC: H01J37/32 ; H01L21/67 ; H01J37/147

Abstract:
Methods and apparatus for controlling a magnetic field in a plasma chamber are provided herein. In some embodiments, a process chamber liner may include a cylindrical body, an inner electromagnetic cosine-theta (cos θ) coil ring including a first plurality of inner coils embedded in the body and configured to generate a magnetic field in a first direction, and an outer electromagnetic cosine-theta (cos θ) coil ring including a second plurality of outer coils embedded in the body and configured to generate a magnetic field in a second direction orthogonal to the first direction, wherein the outer electromagnetic cos θ coil ring is disposed concentrically about the inner electromagnetic cos θ coil ring.
Public/Granted literature
- US09613783B2 Method and apparatus for controlling a magnetic field in a plasma chamber Public/Granted day:2017-04-04
Information query