发明申请
- 专利标题： SUPERLUBRICATING GRAPHENE AND GRAPHENE OXIDE FILMS
- 专利标题（中）： 超级石墨和石墨氧化物膜
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申请号： US14415499申请日： 2013-07-18
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公开(公告)号： US20150197701A1公开(公告)日： 2015-07-16
- 发明人: Anirudha V. Sumant , Ali Erdemir , Junho Choi , Diana Berman
- 申请人： Anirudha V. Sumant , Ali Erdemir , Junho Choi , Diana Berman
- 申请人地址： US IL Chicago
- 专利权人： UChicago Argonne, LLC
- 当前专利权人： UChicago Argonne, LLC
- 当前专利权人地址： US IL Chicago
- 国际申请： PCT/US2013/051121 WO 20130718
- 主分类号： C10M103/04
- IPC分类号： C10M103/04 ; B05D5/08 ; B05D1/02 ; C23C16/26 ; C23C16/40
摘要：
A system and method for forming at least one of graphene and graphene oxide on a substrate and an opposed wear member. The system includes graphene and graphene oxide formed by an exfoliation process or solution processing method to dispose graphene and/or graphene oxide onto a substrate. The system further includes an opposing wear member disposed on another substrate and a gas atmosphere of an inert gas like N2, ambient, a humid atmosphere and a water solution.
公开/授权文献
- US09890345B2 Superlubricating graphene and graphene oxide films 公开/授权日：2018-02-13
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