Invention Application
- Patent Title: Photon Source, Metrology Apparatus, Lithographic System and Device Manufacturing Method
- Patent Title (中): 光子源,计量仪器,光刻系统和器件制造方法
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Application No.: US14548734Application Date: 2014-11-20
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Publication No.: US20150108373A1Publication Date: 2015-04-23
- Inventor: Henricus Petrus Maria PELLEMANS , Pavel Stanislavovich ANTSIFEROV , Vladimir Mihailovitch KRIVTSUN , Johannes Matheus Marie DE WIT , Ralph Jozef Johannes Gerardus Anna Maria SMEETS , Gerbrand VAN DER ZOUW
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Main IPC: H05H1/24
- IPC: H05H1/24 ; G01N21/956 ; G03F7/20

Abstract:
A laser driven light source comprises laser and focusing optics. These produce a beam of radiation focused on a plasma forming zone within a container containing a gas (e.g., Xe). Collection optics collects photons emitted by a plasma maintained by the laser radiation to form a beam of output radiation. Plasma has an elongate form (L>d) and collecting optics is configured to collect photons emerging in the longitudinal direction from the plasma. The brightness of the plasma is increased compared with sources which collect radiation emerging transversely from the plasma. A metrology apparatus using the light source can achieve greater accuracy and/or throughput as a result of the increased brightness. Back reflectors may be provided. Microwave radiation may be used instead of laser radiation to form the plasma.
Public/Granted literature
- US09357626B2 Photon source, metrology apparatus, lithographic system and device manufacturing method Public/Granted day:2016-05-31
Information query
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