Invention Application
- Patent Title: PATTERN FORMATION METHOD, MAGNETIC RECORDING MEDIUM MANUFACTURING METHOD, AND FINE PARTICLE DISPERSION
- Patent Title (中): 图案形成方法,磁记录介质制造方法和细颗粒分散
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Application No.: US14324927Application Date: 2014-07-07
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Publication No.: US20150069014A1Publication Date: 2015-03-12
- Inventor: Kaori KIMURA , Kazutaka TAKIZAWA , Akira FUJIMOTO
- Applicant: KABUSHIKI KAISHA TOSHIBA
- Applicant Address: JP Minato-ku
- Assignee: KABUSHIKI KAISHA TOSHIBA
- Current Assignee: KABUSHIKI KAISHA TOSHIBA
- Current Assignee Address: JP Minato-ku
- Priority: JP2013-187499 20130910; JP2014-092056 20140425
- Main IPC: C09D125/06
- IPC: C09D125/06 ; G11B5/84 ; C09D133/12 ; G11B5/855

Abstract:
According to one embodiment, there is provided a pattern formation method including coating a substrate or mask layer with a fine particle coating solution containing fine particles including a protective group having a close surface polarity and containing, on at least surfaces thereof, a material selected from the group consisting of Al, Ti, V, Cr, Mn, Fe, Co, Ni, Zn, Y, Zr, Sn, Mo, Ta, W, Au, Ag, Pd, Cu, Pt and oxides thereof, a viscosity modifier, and a solvent for adjusting mixing of the viscosity modifier and the fine particles having the protective group to form a fine particle layer on the substrate or mask layer.
Information query
IPC分类: