发明申请
- 专利标题: Electron Beam Interference Device and Electron Beam Interferometry
- 专利标题(中): 电子束干涉仪和电子束干涉仪
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申请号: US13810934申请日: 2012-02-03
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公开(公告)号: US20140332684A1公开(公告)日: 2014-11-13
- 发明人: Ken Harada , Hiroto Kasai
- 申请人: Ken Harada , Hiroto Kasai
- 申请人地址: JP Chiyoda-ku, Tokyo
- 专利权人: Hitachi, Ltd.
- 当前专利权人: Hitachi, Ltd.
- 当前专利权人地址: JP Chiyoda-ku, Tokyo
- 国际申请: PCT/JP2012/000724 WO 20120203
- 主分类号: H01J37/252
- IPC分类号: H01J37/252 ; H01J37/26 ; H01J37/147 ; G01N23/04
摘要:
There is a limit in range and distance in which an electron beam can interfere and electron interference is implemented within a range of a coherence length. Therefore, interference images are consecutively recorded for each interference region width from an interference image of a reference wave and an observation region adjacent to the reference wave by considering that a phase distribution regenerated and observed by an interference microscopy is a differential between phase distributions of two waves used for interference and a differential image between phase distributions of a predetermined observation region and a predetermined reference wave is acquired by acquiring integrating phase distributions acquired by individually regenerating the interference images. This work enables a wide range of interference image which is more than a coherence length by arranging phase distribution images performed and acquired in the respective phase distributions in a predetermined order.
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