发明申请
- 专利标题: NITRIDE SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
- 专利标题(中): 氮化物半导体器件及其制造方法
-
申请号: US14198011申请日: 2014-03-05
-
公开(公告)号: US20140252370A1公开(公告)日: 2014-09-11
- 发明人: June Sik KWAK , Young Do Jong , Ho Young Cha , Bong Ryeol Park , Jae Gil Lee , Kwan Hyun Lee
- 申请人: Seoul Semiconductor Co., Ltd.
- 申请人地址: KR Ansan-si
- 专利权人: Seoul Semiconductor Co., Ltd.
- 当前专利权人: Seoul Semiconductor Co., Ltd.
- 当前专利权人地址: KR Ansan-si
- 优先权: KR10-2013-0023429 20130305; KR10-2013-0032632 20130327
- 主分类号: H01L29/778
- IPC分类号: H01L29/778 ; H01L29/66
摘要:
Exemplary embodiments of the present invention disclose a unidirectional heterojunction transistor including a channel layer made of a first nitride-based semiconductor having a first energy bandgap, a barrier layer made of a second nitride-based semiconductor having a second energy bandgap different from the first energy bandgap, the barrier layer including a recess, a drain electrode disposed on a first region of the barrier layer, and a recessed-drain Schottky electrode disposed in the recess of the barrier layer, the recessed-drain Schottky electrode contacting the drain electrode.
公开/授权文献
信息查询
IPC分类: