Invention Application
- Patent Title: CULTURE CONTROL METHOD, CELL CULTURE APPARATUS, AND APPARATUS FOR EVALUATION OF CELLULAR CHARACTERISTICS
- Patent Title (中): 文化控制方法，细胞培养装置和细胞特性评价装置
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Application No.: US14108409Application Date: 2013-12-17
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Publication No.: US20140178996A1Publication Date: 2014-06-26
- Inventor: Keisuke SHIBUYA , Ryoichi HAGA , Masaru NAMBA , Kenichiro OKA , Ken AMANO
- Applicant: HITACHI, LTD.
- Applicant Address: JP Tokyo
- Assignee: HITACHI, LTD.
- Current Assignee: HITACHI, LTD.
- Current Assignee Address: JP Tokyo
- Priority: JP2012-283501 20121226
- Main IPC: C12M1/34
- IPC: C12M1/34
Abstract:
This invention provides a culture control method and a cell culture apparatus that enable stable cell culture by regulating shear stress to be applied to cells within an adequate range. With the application of such culture control method and cell culture apparatus, cell culture is performed under agitation culture conditions in which the shear stress distribution is 0.5 Pa to 20 Pa in 80% or more of the culture vessel by volume.
Public/Granted literature
- US10011812B2 Culture control method, cell culture apparatus, and apparatus for evaluation of cellular characteristics Public/Granted day:2018-07-03
Information query
