Invention Grant
- Patent Title: Culture control method, cell culture apparatus, and apparatus for evaluation of cellular characteristics
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Application No.: US14108409Application Date: 2013-12-17
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Publication No.: US10011812B2Publication Date: 2018-07-03
- Inventor: Keisuke Shibuya , Ryoichi Haga , Masaru Namba , Kenichiro Oka , Ken Amano
- Applicant: HITACHI, LTD.
- Applicant Address: JP Tokyo
- Assignee: HITACHI, LTD.
- Current Assignee: HITACHI, LTD.
- Current Assignee Address: JP Tokyo
- Agency: Oliff PLC
- Priority: JP2012-283501 20121226
- Main IPC: C12M1/34
- IPC: C12M1/34 ; C12M1/06 ; C12M1/42 ; C12M1/12 ; C12M1/36

Abstract:
This invention provides a culture control method and a cell culture apparatus that enable stable cell culture by regulating shear stress to be applied to cells within an adequate range. With the application of such culture control method and cell culture apparatus, cell culture is performed under agitation culture conditions in which the shear stress distribution is 0.5 Pa to 20 Pa in 80% or more of the culture vessel by volume.
Public/Granted literature
- US20140178996A1 CULTURE CONTROL METHOD, CELL CULTURE APPARATUS, AND APPARATUS FOR EVALUATION OF CELLULAR CHARACTERISTICS Public/Granted day:2014-06-26
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