Invention Application
- Patent Title: GAS BARRIER FILM AND METHOD FOR MANUFACTURING THE SAME
- Patent Title (中): 气体阻隔膜及其制造方法
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Application No.: US13240330Application Date: 2011-09-22
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Publication No.: US20120308808A1Publication Date: 2012-12-06
- Inventor: Ta-Jo LIU , Chin-Ghia LIU , Po-Hao TSAO , Hung-Chih CHEN
- Applicant: Ta-Jo LIU , Chin-Ghia LIU , Po-Hao TSAO , Hung-Chih CHEN
- Applicant Address: TW Hsinchu
- Assignee: NATIONAL TSING HUA UNIVERSITY
- Current Assignee: NATIONAL TSING HUA UNIVERSITY
- Current Assignee Address: TW Hsinchu
- Priority: TW100119077 20110531
- Main IPC: B32B5/16
- IPC: B32B5/16 ; B32B5/00 ; B32B27/36 ; B32B27/06 ; B32B27/30 ; B32B27/32 ; B32B15/04 ; B32B17/06 ; B32B27/38 ; B32B27/40 ; B05D1/36 ; B32B37/00 ; B32B37/12 ; B32B9/04 ; B82Y30/00
Abstract:
A gas barrier film and method for manufacturing the abovementioned gas barrier film are disclosed in the present invention. The gas barrier film is applied in electronic product, food, medicine and other fields for protecting them from gas and water. The gas barrier film comprises a gas barrier layer and pluralities of cladding layers. The gas barrier layer is a liquid layer, and the cladding layers are disposed on the opposite surface of the gas barrier layer.
Information query
