发明申请
- 专利标题： SUBSTRATE DRYING APPARATUS AND METHOD
- 专利标题（中）： 基板干燥装置和方法
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申请号： US13518631申请日： 2010-12-07
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公开(公告)号： US20120255193A1公开(公告)日： 2012-10-11
- 发明人: Akitake Tamura
- 申请人： Akitake Tamura
- 申请人地址： JP Tokyo
- 专利权人： TOKYO ELECTRON LIMITED
- 当前专利权人： TOKYO ELECTRON LIMITED
- 当前专利权人地址： JP Tokyo
- 优先权： JP2009-295503 20091225
- 国际申请： PCT/JP10/71855 WO 20101207
- 主分类号： F26B25/00
- IPC分类号： F26B25/00
摘要：
A substrate drying apparatus which dries a substrate cleaned by a diamagnetic liquid includes a magnet unit for moving the liquid adhering to the substrate by means of a magnetic force; and a magnet transfer mechanism for moving the magnet unit along the substrate toward an edge of the substrate. A substrate drying method of drying a substrate cleaned by a diamagnetic liquid includes bringing a magnet unit close to the substrate, the magnet unit being configured to move the liquid adhering to the substrate by means of a magnetic force; and moving the magnet unit along the substrate toward the edge of the substrate.
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