Invention Application
US20090230299A1 ION SOURCE, ION BEAM PROCESSING/OBSERVATION APPARATUS, CHARGED PARTICLE BEAM APPARATUS, AND METHOD FOR OBSERVING CROSS SECTION OF SAMPLE
有权
离子源,离子束加工/观察装置,充电颗粒光束装置和观察样品的交叉部分的方法
- Patent Title: ION SOURCE, ION BEAM PROCESSING/OBSERVATION APPARATUS, CHARGED PARTICLE BEAM APPARATUS, AND METHOD FOR OBSERVING CROSS SECTION OF SAMPLE
- Patent Title (中): 离子源,离子束加工/观察装置,充电颗粒光束装置和观察样品的交叉部分的方法
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Application No.: US12108037Application Date: 2008-04-23
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Publication No.: US20090230299A1Publication Date: 2009-09-17
- Inventor: Hiroyasu Shichi , Satoshi Tomimatsu , Kaoru Umemura , Noriyuki Kaneoka , Koji Ishiguro
- Applicant: Hiroyasu Shichi , Satoshi Tomimatsu , Kaoru Umemura , Noriyuki Kaneoka , Koji Ishiguro
- Priority: JP2007-113358 20070423; JP2007-161691 20070619
- Main IPC: H01J49/26
- IPC: H01J49/26 ; H01J27/02

Abstract:
An ion beam machining and observation method relevant to a technique of cross sectional observation of an electronic component, through which a sample is machined by using an ion beam and a charged particle beam processor capable of reducing the time it takes to fill up a processed hole with a high degree of flatness at the filled area. The observation device is capable of switching the kind of gas ion beam used for machining a sample with the kind of a gas ion beam used for observing the sample. To implement the switch between the kind of a gas ion beam used for sample machining and the kind of a gas ion beam used for sample observation, at least two gas introduction systems are used, each system having a gas cylinder a gas tube, a gas volume control valve, and a stop valve.
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