发明申请
- 专利标题: Illumination optical apparatus, exposure apparatus, and method for producing device
- 专利标题(中): 照明光学装置,曝光装置及其制造方法
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申请号: US12292384申请日: 2008-11-18
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公开(公告)号: US20090141257A1公开(公告)日: 2009-06-04
- 发明人: Jin Nishikawa
- 申请人: Jin Nishikawa
- 申请人地址: JP Tokyo
- 专利权人: NIKON CORPORATION
- 当前专利权人: NIKON CORPORATION
- 当前专利权人地址: JP Tokyo
- 主分类号: G03B27/54
- IPC分类号: G03B27/54 ; F21S8/00 ; G03B27/32
摘要:
A reflection type illumination optical apparatus, which guides an exposure light to a reticle surface via a curved mirror, a concave mirror, etc. includes a vacuum chamber which accommodates the curved mirror, the concave mirror, etc; and a subchamber which is arranged in the vacuum chamber and which accommodates the curved mirror. The subchamber has openings through which the exposure light coming into the curved mirror and the exposure light exiting from the curved mirror pass, respectively. Each of the openings is arranged in the vicinity of a position at which the cross-sectional area of the light flux is smallest. It is possible to decrease the amount of adhesion of minute particles such as debris to the reflecting optical element, without unnecessarily enhancing the ability of the vacuum gas discharge mechanism.
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