Invention Application
- Patent Title: Integrated Circuit Arrangement Comprising a Field Effect Transistor, Especially a Tunnel Field Effect Transistor
- Patent Title (中): 包括场效应晶体管,特别是隧道场效应晶体管的集成电路布置
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Application No.: US11816822Application Date: 2005-12-09
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Publication No.: US20090101975A1Publication Date: 2009-04-23
- Inventor: Juergen Holz , Ronald Kakoschke , Thomas Nirschl , Christian Pacha , Klaus Schruefer , Thomas Schulz , Doris Schmitt-Landsiedel
- Applicant: Juergen Holz , Ronald Kakoschke , Thomas Nirschl , Christian Pacha , Klaus Schruefer , Thomas Schulz , Doris Schmitt-Landsiedel
- Applicant Address: DE Neubiberg
- Assignee: INFINEON TECHNOLOGIES AG
- Current Assignee: INFINEON TECHNOLOGIES AG
- Current Assignee Address: DE Neubiberg
- Priority: DE102005007822.2 20050221
- International Application: PCT/EP05/56659 WO 20051209
- Main IPC: H01L29/02
- IPC: H01L29/02

Abstract:
An explanation is given of, inter alia, tunnel field effect transistors having a thicker gate dielectric (GD1) in comparison with other transistors (T2) on the same integrated circuit arrangement (10). As an alternative or in addition, said tunnel field effect transistors have gate regions at mutually remote sides of a channel forming region or an interface between the connection regions (D1, S1) of the tunnel field effect transistor.
Public/Granted literature
Information query
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