发明申请
- 专利标题： Methods for discretized processing of regions of a substrate
- 专利标题（中）： 离子处理基板区域的方法
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申请号： US11352016申请日： 2006-02-10
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公开(公告)号： US20070082487A1公开(公告)日： 2007-04-12
- 发明人: Tony Chiang , David Lazovsky , Thomas Boussie , Alexander Gorer
- 申请人： Tony Chiang , David Lazovsky , Thomas Boussie , Alexander Gorer
- 主分类号： H01L21/44
- IPC分类号： H01L21/44
摘要：
The present invention provides methods and systems for discretized, combinatorial processing of regions of a substrate such as for the discovery, implementation, optimization, and qualification of new materials, processes, and process sequence integration schemes used in integrated circuit fabrication. A substrate having an array of differentially processed regions thereon is processed by delivering materials to or modifying regions of the substrate.
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