发明申请
- 专利标题： Vacuum processing apparatus
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申请号： US11346621申请日： 2006-02-02
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公开(公告)号： US20060191118A1公开(公告)日： 2006-08-31
- 发明人: Young Lee , Jun Choi , Hyoung-Kyu Son , Jeong-Bin Lee , Gyeong-Hoon Kim , Hyung-Soo Kim , Myung-Woo Han
- 申请人： Young Lee , Jun Choi , Hyoung-Kyu Son , Jeong-Bin Lee , Gyeong-Hoon Kim , Hyung-Soo Kim , Myung-Woo Han
- 优先权： KR10-2005-0010481 20050204; KR10-2005-0097664 20051017; KR10-2005-0097621 20051017; KR10-2005-0097652 20051017; KR10-2005-0097625 20051017; KR10-2005-0097642 20051017; KR10-2005-0097646 20051017; KR10-2005-0097667 20051017
- 主分类号： B23P19/04
- IPC分类号： B23P19/04
摘要：
Disclosed herein is a vacuum processing apparatus for performing a desired process for a substrate after establishing a vacuum atmosphere therein. More particularly, the vacuum processing apparatus includes a vacuum chamber, which is divided into a chamber body and an upper cover. The upper cover is configured to be easily opened away from and closed to the chamber body.
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