Invention Application
- Patent Title: High throughput physical vapor deposition system for material combinatorial studies
- Patent Title (中): 用于材料组合研究的高通量物理气相沉积系统
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Application No.: US10757302Application Date: 2004-01-14
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Publication No.: US20050150760A1Publication Date: 2005-07-14
- Inventor: Ting He , Eric Kreidler , Tadashi Nomura
- Applicant: Ting He , Eric Kreidler , Tadashi Nomura
- Main IPC: C23C14/04
- IPC: C23C14/04 ; C23C14/32 ; C23C14/50 ; C23C14/54 ; C23C16/00

Abstract:
An infinitely variable physical vapor deposition matrix system that allows the synthesis of multiple combinatorial catalyst samples at essentially the same time, by the co-deposition of multiple materials, or the sequential layer by layer deposition of multiple catalyst constituents, or both, such that the optimum mix of materials for a pre-determined application can be experimentally determined in subsequent testing. The discovery of optimal catalyst combinations for utilization in specified reactions and devices is facilitated. The high throughput system reduces the time and complexity of processing typically required to formulate and test combinatorial catalyst materials.
Public/Granted literature
- US08944002B2 High throughput physical vapor deposition system for material combinatorial studies Public/Granted day:2015-02-03
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