Invention Application
- Patent Title: Semiconductor device and method for evaluating characteristics of the same
- Patent Title (中): 用于评估其特性的半导体器件和方法
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Application No.: US10824426Application Date: 2004-04-15
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Publication No.: US20040212016A1Publication Date: 2004-10-28
- Inventor: Takatoshi Yasui , Atsuhiro Kajiya
- Applicant: MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD
- Applicant Address: null
- Assignee: MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD
- Current Assignee: MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD
- Current Assignee Address: null
- Priority: JP2003-120078 20030424
- Main IPC: H01L029/76
- IPC: H01L029/76

Abstract:
A single evaluation portion is formed by disposing a plurality of MIS transistors used for evaluation having substantially the same structure as that of an actually used MIS transistor. In the evaluation portion, the respective source regions, drain regions, and gate electrodes of the MIS transistors used for evaluation are electrically connected in common to a source pad, a drain pad, and a gate pad, respectively. If the effective gate width of the single evaluation portion exceeds a given value, variations in characteristics evaluated by the evaluation portion approach variations in the characteristics of the entire semiconductor device. The accuracy of evaluating the characteristics of the semiconductor device can thus be improved by using the evaluation portion.
Public/Granted literature
- US07042007B2 Semiconductor device and method for evaluating characteristics of the same Public/Granted day:2006-05-09
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