- 专利标题: Multiple charged-particle beam apparatus with low crosstalk
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申请号: US17944157申请日: 2022-09-13
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公开(公告)号: US12033830B2公开(公告)日: 2024-07-09
- 发明人: Weiming Ren , Xuerang Hu , Qingpo Xi , Xuedong Liu
- 申请人: ASML Netherlands B.V.
- 申请人地址: NL Veldhoven
- 专利权人: ASML Netherlands B.V.
- 当前专利权人: ASML Netherlands B.V.
- 当前专利权人地址: NL Veldhoven
- 代理机构: Finnegan, Henderson, Farabow, Garrett & Dunner, LLP
- 主分类号: H01J37/244
- IPC分类号: H01J37/244 ; H01J37/153 ; H01J37/28
摘要:
Systems and methods of enhancing imaging resolution by reducing crosstalk between detection elements of a secondary charged-particle detector in a multi-beam apparatus are disclosed. The multi-beam apparatus may comprise an electro-optical system for projecting a plurality of secondary charged-particle beams from a sample onto a charged-particle detector. The electro-optical system may include a first pre-limit aperture plate comprising a first aperture configured to block peripheral charged-particles of the plurality of secondary charged-particle beams, and a beam-limit aperture array comprising a second aperture configured to trim the plurality of secondary charged-particle beams. The charged-particle detector may include a plurality of detection elements, wherein a detection element of the plurality of detection elements is associated with a corresponding trimmed beam of the plurality of secondary charged-particle beams.
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