- 专利标题: Semiconductor device and method for manufacturing semiconductor device
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申请号: US17331013申请日: 2021-05-26
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公开(公告)号: US12021043B2公开(公告)日: 2024-06-25
- 发明人: Hiroaki Hokazono , Ryoichi Kato
- 申请人: FUJI ELECTRIC CO., LTD.
- 申请人地址: JP Kawasaki
- 专利权人: FUJI ELECTRIC CO., LTD.
- 当前专利权人: FUJI ELECTRIC CO., LTD.
- 当前专利权人地址: JP Kawasaki
- 优先权: JP 19114534 2019.06.20
- 主分类号: H01L23/00
- IPC分类号: H01L23/00 ; H01L21/48 ; H01L23/373 ; H01L25/00 ; H01L25/07 ; H01L25/18
摘要:
A semiconductor device includes: a first semiconductor chip having a metal layer on a top surface; a first wiring member arranged to face the metal layer; a sintered-metal layer arranged between the metal layer and the first wiring member, having a first region and a plurality of second regions provided inside the first region, the second regions having lower tensile strength than the first region; and a metallic member arranged inside the sintered-metal layer, wherein the second regions of the sintered-metal layer have lower tensile strength than the metal layer of the first semiconductor chip.
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