- 专利标题: Method of forming an electrical metal contact and method of producing a vertical cavity surface emitting laser
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申请号: US17204004申请日: 2021-03-17
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公开(公告)号: US11862933B2公开(公告)日: 2024-01-02
- 发明人: Roman Koerner , Alexander Weigl
- 申请人: TRUMPF Photonic Components GmbH
- 申请人地址: DE Ulm
- 专利权人: TRUMPF PHOTONIC COMPONENTS GMBH
- 当前专利权人: TRUMPF PHOTONIC COMPONENTS GMBH
- 当前专利权人地址: DE Ulm
- 代理机构: LEYDIG, VOIT & MAYER, LTD.
- 优先权: EP 164475 2020.03.20
- 主分类号: H01S5/183
- IPC分类号: H01S5/183 ; H01S5/042
摘要:
A method of forming an electrical metal contact within a semiconductor layer stack of a vertical cavity surface emitting laser includes forming a contact hole into the semiconductor layer stack. The contact hole has a bottom and a side wall extending from the bottom. The method further includes providing a photoresist mask inside the contact hole. The photoresist mask covers the side wall of the contact hole and has an opening extending to the bottom of the contact hole. The method additionally includes wet-chemical isotropic etching the bottom of the contact hole, depositing a metal on the bottom of the contact hole, and removing the photoresist mask so that the metal on the bottom of the contact hole is left as the electrical metal contact.
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