Invention Grant
- Patent Title: Microstructure enhanced absorption photosensitive devices
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Application No.: US17182954Application Date: 2021-02-23
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Publication No.: US11791432B2Publication Date: 2023-10-17
- Inventor: Shih-Yuan Wang , Shih-Ping Wang
- Applicant: W&WSens Devices, Inc.
- Applicant Address: US CA Los Altos
- Assignee: W&WSens Devices, Inc.
- Current Assignee: W&WSens Devices, Inc.
- Current Assignee Address: US CA Los Altos
- Agency: Wissing Miller LLP
- The original application number of the division: US16528958 2019.08.01
- Main IPC: H01L27/146
- IPC: H01L27/146 ; H01L31/0236 ; H01L31/0352 ; H01L31/18 ; H01L27/144 ; H04B10/69 ; H01L31/02 ; H01L31/0232 ; H01L31/09 ; H01L31/103 ; H01L31/028 ; H01L31/107 ; H04B10/25 ; H04B10/40 ; H04B10/80 ; G02B1/00 ; G02B6/42 ; H01L31/077 ; H01L31/036 ; H01L31/075 ; H01L31/105

Abstract:
Lateral and vertical microstructure enhanced photodetectors and avalanche photodetectors are monolithically integrated with CMOS/BiCMOS ASICs and can also be integrated with laser devices using fluidic assembly techniques. Photodetectors can be configured in a vertical PIN arrangement or lateral metal-semiconductor-metal arrangement where electrodes are in an inter-digitated pattern. Microstructures, such as holes and protrusions, can improve quantum efficiency in silicon, germanium and III-V materials and can also reduce avalanche voltages for avalanche photodiodes. Applications include optical communications within and between datacenters, telecommunications, LIDAR, and free space data communication.
Public/Granted literature
- US20210242354A1 MICROSTRUCTURE ENHANCED ABSORPTION PHOTOSENSITIVE DEVICES Public/Granted day:2021-08-05
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