- 专利标题： Susceptor for semiconductor substrate processing
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申请号： US17075504申请日： 2020-10-20
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公开(公告)号： US11764101B2公开(公告)日： 2023-09-19
- 发明人: Saket Rathi , Shiva K. T. Rajavelu Muralidhar , Siyao Luan , Alexandros Demos , Xing Lin
- 申请人： ASM IP HOLDING B.V.
- 申请人地址： NL Almere
- 专利权人： ASM IP Holding, B.V.
- 当前专利权人： ASM IP Holding, B.V.
- 当前专利权人地址： NL Almere
- 代理机构： Banner & Witcoff, Ltd.
- 主分类号： H01L21/324
- IPC分类号： H01L21/324 ; H01L21/687 ; H01L21/67 ; H01L21/268 ; H01L21/683
摘要：
A susceptor for semiconductor substrate processing is disclosed herein. In some embodiments, the susceptor may comprise an inner susceptor portion and an outer susceptor portion. The susceptor portions may self-align via complementary features, such as tabs on the outer susceptor and recesses on the inner susceptor portion. The inner susceptor portion may contain several contact pads with which to support a wafer during semiconductor processing. In some embodiments, the contact pads are hemispherical to reduce contact area with the wafer, thereby reducing risk of backside damage. The inner susceptor portion may contain a cavity with which to receive a thermocouple. In some embodiments, the diameter of the cavity is greater than the diameter of the thermocouple such that the thermocouple does not contact the walls of the cavity during processing, thereby providing highly accurate temperature measurements.
公开/授权文献
- US20210125853A1 SUSCEPTOR FOR SEMICONDUCTOR SUBSTRATE PROCESSING 公开/授权日：2021-04-29
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