- 专利标题: Film bulk acoustic resonator with spurious resonance suppression
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申请号: US16820625申请日: 2020-03-16
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公开(公告)号: US11736088B2公开(公告)日: 2023-08-22
- 发明人: Robert B. Stokes , Alvin M. Kong , Liping D. Hou , Dae-Jin Hyun , Shing-Kuo Wang
- 申请人: Global Communication Semiconductors, LLC
- 申请人地址: US CA Torrance
- 专利权人: GLOBAL COMMUNICATION SEMICONDUCTORS, LLC
- 当前专利权人: GLOBAL COMMUNICATION SEMICONDUCTORS, LLC
- 当前专利权人地址: US CA Torrance
- 代理机构: Morgan, Lewis & Bockius LLP
- 主分类号: H03H9/17
- IPC分类号: H03H9/17 ; H03H9/02 ; H03H9/13
摘要:
Devices and processes for preparing devices are described for reducing resonance of spurious waves in a bulk acoustic resonator and/or for obstructing propagation of lateral waves out of an active region of the bulk acoustic resonator. A first electrode is coupled to a first side of a piezoelectric layer and a second electrode is coupled to a second side of the piezoelectric layer to form a stack having the active region. The piezoelectric layer in the active region is configured to resonate in response to an electrical signal applied between the first electrode and the second electrode. One or more perforations in the first electrode, the piezoelectric layer and/or the second electrode, and/or one or more posts or beams supporting the stack, reduce resonance of spurious waves and obstruct propagation of lateral acoustic waves out of the active region.
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