- 专利标题: Color imaging for CMP monitoring
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申请号: US16744058申请日: 2020-01-15
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公开(公告)号: US11715193B2公开(公告)日: 2023-08-01
- 发明人: Dominic J. Benvegnu , Robert D. Tolles , Boguslaw A. Swedek , Abraham Ravid
- 申请人: Applied Materials, Inc.
- 申请人地址: US CA Santa Clara
- 专利权人: Applied Materials, Inc.
- 当前专利权人: Applied Materials, Inc.
- 当前专利权人地址: US CA Santa Clara
- 代理机构: Fish & Richardson P.C.
- 分案原申请号: US14942777 2015.11.16
- 主分类号: G06T7/00
- IPC分类号: G06T7/00 ; H04N23/10 ; B24B37/013 ; G06F3/04842 ; G06F3/04847 ; G06F3/0486 ; G06T5/00 ; G06T5/50
摘要:
A metrology technique for analyzing a substrate includes storing data indicating a boundary of an area in a 2-dimensional color space having a pair of color channels including a first color channel and a second color channel as axes of the color space, receiving color data of a substrate from a camera, generating a color image of the substrate from the color data, performing a comparison of a pair of color values for the pair of color channels for the pixel to the boundary of the area in the 2-dimensional color space for each pixel of a plurality of pixels of the color image to determine whether the pair of color values meet thresholds provided by the boundary, and generating a signal to an operator based on results of the comparison for the plurality of pixels.
公开/授权文献
- US20200151868A1 COLOR IMAGING FOR CMP MONITORING 公开/授权日:2020-05-14
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