Vertical diode in stacked transistor architecture
摘要:
An integrated circuit structure includes a first semiconductor fin extending horizontally in a length direction and including a bottom portion and a top portion above the bottom portion, a bottom transistor associated with the bottom portion of the first semiconductor fin, a top transistor above the bottom transistor and associated with the top portion of the first semiconductor fin, and a first vertical diode. The first vertical diode includes: a bottom region associated with at least the bottom portion of the first semiconductor fin, the bottom region including one of n-type and p-type dopant; a top region associated with at least the top portion of the first semiconductor fin, the top region including the other of n-type and p-type dopant; a bottom terminal electrically connected to the bottom region; and a top terminal electrically connected to the top region at the top portion of the first semiconductor fin.
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