- 专利标题： Photoresist composition
-
申请号： US15371702申请日： 2016-12-07
-
公开(公告)号： US11561471B2公开(公告)日： 2023-01-24
- 发明人: Masako Sugihara , Takashi Nishimura , Hiromu Sakamoto
- 申请人： SUMITOMO CHEMICAL COMPANY, LIMITED
- 申请人地址： JP Tokyo
- 专利权人： SUMITOMO CHEMICAL COMPANY, LIMITED
- 当前专利权人： SUMITOMO CHEMICAL COMPANY, LIMITED
- 当前专利权人地址： JP Tokyo
- 代理机构： Birch, Stewart, Kolasch & Birch, LLP
- 优先权： JPJP2015-239949 20151209
- 主分类号： G03F7/039
- IPC分类号： G03F7/039 ; G03F7/30 ; G03F7/38 ; C08F220/28 ; C08F220/18
摘要：
A photoresist composition comprising:
a resin which has a structural unit represented by formula (I): wherein R1 represents a hydrogen atom, a halogen atom, or a C1 to C6 alkyl group which optionally has a halogen atom, and R2 represents a C1 to C42 hydrocarbon group which optionally has a substituent; an alkali-soluble resin;
an acid generator; and
a solvent.
a resin which has a structural unit represented by formula (I): wherein R1 represents a hydrogen atom, a halogen atom, or a C1 to C6 alkyl group which optionally has a halogen atom, and R2 represents a C1 to C42 hydrocarbon group which optionally has a substituent; an alkali-soluble resin;
an acid generator; and
a solvent.
公开/授权文献
- US20170168393A1 PHOTORESIST COMPOSITION 公开/授权日：2017-06-15
信息查询
IPC分类:
