- 专利标题: High-density low voltage multi-element ferroelectric gain memory bit-cell with planar capacitors
-
申请号: US17346087申请日: 2021-06-11
-
公开(公告)号: US11521666B1公开(公告)日: 2022-12-06
- 发明人: Rajeev Kumar Dokania , Noriyuki Sato , Tanay Gosavi , Pratyush Pandey , Debo Olaosebikan , Amrita Mathuriya , Sasikanth Manipatruni
- 申请人: Kepler Computing Inc.
- 申请人地址: US CA San Francisco
- 专利权人: Kepler Computing Inc.
- 当前专利权人: Kepler Computing Inc.
- 当前专利权人地址: US CA San Francisco
- 代理机构: Mughal IP P.C.
- 主分类号: G11C11/22
- IPC分类号: G11C11/22 ; H01L27/11514 ; H01L27/11504 ; G11C5/10
摘要:
A high-density low voltage ferroelectric (or paraelectric) memory bit-cell that includes a planar ferroelectric or paraelectric capacitor. The memory bit-cell comprises 1T1C configuration, where a plate-line is parallel to a word-line, or the plate-line is parallel to a bit-line. The memory bit-cell can be 1TnC, where ‘n’ is a number. In a 1TnC bit-cell, the capacitors are vertically stacked allowing for multiple values to be stored in a single bit-cell. The memory bit-cell can be multi-element FE gain bit-cell. In a multi-element FE gain bit-cell, data sensing is done with signal amplified by a gain transistor in the bit-cell. As such, higher storage density is realized using multi-element FE gain bit-cells. In some examples, the 1T1C, 1TnC, and multi-element FE gain bit-cells are multi-level bit-cells. To realize multi-level bit-cells, the capacitor is placed in a partially switched polarization state by applying different voltage levels or different time pulse widths at the same voltage level.
信息查询