- 专利标题: Silicon-containing polymer, film-forming composition, method for forming silicon-containing polymer coating, method for forming silica-based coating, and production method for silicon-containing polymer
-
申请号: US16871962申请日: 2020-05-11
-
公开(公告)号: US11377522B2公开(公告)日: 2022-07-05
- 发明人: Kunihiro Noda , Takehiro Seshimo , Keisuke Kubo , Yohei Kinoshita
- 申请人: TOKYO OHKA KOGYO CO., LTD.
- 申请人地址: JP Kawasaki
- 专利权人: TOKYO OHKA KOGYO CO., LTD.
- 当前专利权人: TOKYO OHKA KOGYO CO., LTD.
- 当前专利权人地址: JP Kawasaki
- 代理机构: Knobbe Martens Olson & Bear LLP
- 优先权: JPJP2019-091495 20190514
- 主分类号: C08G77/28
- IPC分类号: C08G77/28 ; C08G77/392 ; C08L83/08 ; B05D1/00 ; B05D3/02 ; C09D183/08 ; B05D1/02 ; C08G77/60 ; B05D3/00
摘要:
A silicon-containing polymer which results in a composition that forms a coated film having good adhesive properties to a substrate and does not easily peel off the substrate, a film-forming composition including the polymer, a method for forming a silicon-containing polymer coating using the composition, a method for forming a silica-based coating using the composition, and a production method for the polymer. In a silicon-containing polymer including at least one of poly- or oligo-siloxane chain and poly- or oligo-silane chain in a molecular chain, a group having a silyl group and a sulfide group, which can be subjected to a condensation reaction, is introduced into the molecular chain, for example, by an ene-thiol reaction.
信息查询