- 专利标题: Device crack-stop structure to prevent damage due to dicing crack
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申请号: US16589460申请日: 2019-10-01
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公开(公告)号: US11348881B2公开(公告)日: 2022-05-31
- 发明人: Tung-Ting Wu , Chen-Jong Wang , Jen-Cheng Liu , Yimin Huang , Chin-Chia Kuo
- 申请人: Taiwan Semiconductor Manufacturing Co., Ltd.
- 申请人地址: TW Hsin-Chu
- 专利权人: Taiwan Semiconductor Manufacturing Co., Ltd.
- 当前专利权人: Taiwan Semiconductor Manufacturing Co., Ltd.
- 当前专利权人地址: TW Hsin-Chu
- 代理机构: Eschweiler & Potashnik, LLC
- 主分类号: H01L23/58
- IPC分类号: H01L23/58 ; H01L27/146
摘要:
Various embodiments of the present disclosure are directed towards a semiconductor structure including a crack-stop structure disposed within a semiconductor substrate. The semiconductor substrate has a back-side surface and a front-side surface opposite the back-side surface. Photodetectors are disposed within the semiconductor substrate and are laterally spaced within a device region. An interconnect structure is disposed along the front-side surface. The interconnect structure includes a seal ring structure. A crack-stop structure is disposed within the semiconductor substrate and overlies the seal ring structure. The crack-stop structure continuously extends around the device region.
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