- 专利标题: Charged particle beam device
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申请号: US17287233申请日: 2019-02-05
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公开(公告)号: US11348758B2公开(公告)日: 2022-05-31
- 发明人: Anoru Suga , Shuhei Yabu , Kazuki Ishizawa , Michio Hatano
- 申请人: Hitachi High-Tech Corporation
- 申请人地址: JP Tokyo
- 专利权人: Hitachi High-Tech Corporation
- 当前专利权人: Hitachi High-Tech Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: Crowell & Moring LLP
- 国际申请: PCT/JP2019/004023 WO 20190205
- 国际公布: WO2020/161795 WO 20200813
- 主分类号: H01J37/248
- IPC分类号: H01J37/248 ; H01J1/13 ; H01J37/06 ; H01J37/24
摘要:
An objective of the present invention is to provide a charged particle beam device capable of estimating a lifetime of a filament of a charged particle beam source with a cheap and simple circuit configuration. The charged particle beam device according to the present invention includes a boosting circuit that boosts a voltage to be supplied to a filament and estimates a remaining duration of the filament using a measured value of a current flowing on a low-voltage side of the boosting circuit (see FIG. 3).
公开/授权文献
- US20210391143A1 Charged Particle Beam Device 公开/授权日:2021-12-16
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