- 专利标题: Seal ring structures and methods of forming same
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申请号: US16933082申请日: 2020-07-20
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公开(公告)号: US11342322B2公开(公告)日: 2022-05-24
- 发明人: Kuo-Ming Wu , Kuan-Liang Liu , Wen-De Wang , Yung-Lung Lin
- 申请人: Taiwan Semiconductor Manufacturing Co., Ltd.
- 申请人地址: TW Hsin-Chu
- 专利权人: Taiwan Semiconductor Manufacturing Co., Ltd.
- 当前专利权人: Taiwan Semiconductor Manufacturing Co., Ltd.
- 当前专利权人地址: TW Hsin-Chu
- 代理机构: Eschweiler & Potashnik, LLC
- 主分类号: H01L25/00
- IPC分类号: H01L25/00 ; H01L23/58 ; H01L23/00 ; H01L25/065 ; H01L25/18 ; H01L23/31
摘要:
Some embodiments relate to a three-dimensional (3D) integrated circuit (IC). The 3D IC includes a first IC die comprising a first semiconductor substrate, and a first interconnect structure over the first semiconductor substrate. The 3D IC also includes a second IC die comprising a second semiconductor substrate, and a second interconnect structure that separates the second semiconductor substrate from the first interconnect structure. A seal ring structure separates the first interconnect structure from the second interconnect structure and perimetrically surrounds a gas reservoir between the first IC die and second IC die. The seal ring structure includes a sidewall gas-vent opening structure configured to allow gas to pass between the gas reservoir and an ambient environment surrounding the 3D IC.
公开/授权文献
- US20200350302A1 SEAL RING STRUCTURES AND METHODS OF FORMING SAME 公开/授权日:2020-11-05
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