- 专利标题: Apparatus and method for manufacturing a wafer
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申请号: US16182050申请日: 2018-11-06
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公开(公告)号: US11309177B2公开(公告)日: 2022-04-19
- 发明人: Ruggero Anzalone , Nicolo′ Frazzetto
- 申请人: STMICROELECTRONICS S.r.l.
- 申请人地址: IT Agrate Brianza
- 专利权人: STMICROELECTRONICS S.r.l.
- 当前专利权人: STMICROELECTRONICS S.r.l.
- 当前专利权人地址: IT Agrate Brianza
- 代理机构: Seed IP Law Group LLP
- 主分类号: H01L21/02
- IPC分类号: H01L21/02 ; H01L29/16 ; H01L21/683 ; C23C16/01 ; C23C16/32
摘要:
Various embodiments provide an apparatus and method for fabricating a wafer, such as a SiC wafer. The apparatus includes a support having a plurality of arms for supporting a substrate. The arms allows for physical contact between the support and the substrate to be minimized. As a result, when the substrate is melted, surface tension between the arms and molten material is reduced, and the molten material will be less likely to cling to the support.
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