- 专利标题： Reflector, surface emitting laser, method for manufacturing reflector, and method for manufacturing surface emitting laser
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申请号： US16287541申请日： 2019-02-27
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公开(公告)号： US11245249B2公开(公告)日： 2022-02-08
- 发明人: Takeshi Kawashima , Shunichi Sato , Morimasa Kaminishi , Hirokazu Iwata
- 申请人： Ricoh Company, Ltd.
- 申请人地址： JP Tokyo
- 专利权人： Ricoh Company, Ltd.
- 当前专利权人： Ricoh Company, Ltd.
- 当前专利权人地址： JP Tokyo
- 代理机构： Xsensus LLP
- 优先权： JPJP2018-036354 20180301,JPJP2018-233726 20181213
- 主分类号： H01S5/183
- IPC分类号： H01S5/183 ; H01S5/22 ; H01S5/024 ; H01S5/343 ; H01S5/42 ; H01S5/042 ; G03B21/20 ; F21S41/176 ; F21S41/16 ; G02B26/08 ; G02B26/10
摘要：
A reflector includes a low refractive index layer and a high refractive index layer. The low refractive index layer has a first average refractive index and has a laminated structure in which an AlN layer and a GaN layer are alternately laminated. The high refractive index layer has a second average refractive index higher than the first average refractive index and includes an InGaN layer.
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