Invention Grant
- Patent Title: Semiconductor structure and method manufacturing the same
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Application No.: US16737869Application Date: 2020-01-08
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Publication No.: US11164848B2Publication Date: 2021-11-02
- Inventor: Ming-Fa Chen , Chao-Wen Shih , Min-Chien Hsiao , Sung-Feng Yeh , Tzuan-Horng Liu , Chuan-An Cheng
- Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
- Applicant Address: TW Hsinchu
- Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee Address: TW Hsinchu
- Agency: JCIPRNET
- Main IPC: H01L25/065
- IPC: H01L25/065 ; H01L23/48 ; H01L25/00 ; H01L23/31

Abstract:
A semiconductor structure includes a stacked structure. The stacked structure includes a first semiconductor die and a second semiconductor die. The first semiconductor die includes a first semiconductor substrate having a first active surface and a first back surface opposite to the first active surface. The second semiconductor die is over the first semiconductor die, and includes a second semiconductor substrate having a second active surface and a second back surface opposite to the second active surface. The second semiconductor die is bonded to the first semiconductor die through joining the second active surface to the first back surface at a first hybrid bonding interface along a vertical direction. Along a lateral direction, a first dimension of the first semiconductor die is greater than a second dimension of the second semiconductor die.
Information query
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