- 专利标题： Semiconductor device and methods of manufacturing
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申请号： US16398542申请日： 2019-04-30
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公开(公告)号： US11145560B2公开(公告)日： 2021-10-12
- 发明人: Hung-Jui Kuo , Hsing-Chieh Lee , Ming-Tan Lee
- 申请人： Taiwan Semiconductor Manufacturing Company, Ltd.
- 申请人地址： TW Hsinchu
- 专利权人： Taiwan Semiconductor Manufacturing Company, Ltd.
- 当前专利权人： Taiwan Semiconductor Manufacturing Company, Ltd.
- 当前专利权人地址： TW Hsinchu
- 代理机构： Slater Matsil, LLP
- 主分类号： H01L21/66
- IPC分类号： H01L21/66 ; H01L21/027 ; H01L21/768 ; H01L21/56 ; H01L23/00 ; H01L23/31 ; H01L23/48 ; H01L23/522 ; H01L23/528 ; H01L25/065 ; G03F7/38 ; G03F7/004 ; G03F7/039
摘要：
A photoresist with a detection additive is utilized to help increase the contrast of images during an after development inspection process. The detection additive fluoresces during the after development inspection process and adds to the energy that is reflected during the after development inspection process, increasing the contrast during the after development inspection process and helping to identify defects that are not otherwise detectable.
公开/授权文献
- US20200350218A1 Semiconductor Device and Methods of Manufacturing 公开/授权日：2020-11-05
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