Invention Grant
- Patent Title: Method for manufacturing resistor, and resistor
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Application No.: US16903674Application Date: 2020-06-17
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Publication No.: US11011290B2Publication Date: 2021-05-18
- Inventor: Yuichi Abe , Seiji Karasawa , Michio Kubota , Yoji Gomi , Koichi Minowa
- Applicant: KOA CORPORATION
- Applicant Address: JP Ina
- Assignee: KOA CORPORATION
- Current Assignee: KOA CORPORATION
- Current Assignee Address: JP Ina
- Agency: Westerman, Hattori, Daniels & Adrian, LLP
- Priority: JPJP2017-237821 20171212
- Main IPC: H01C17/28
- IPC: H01C17/28

Abstract:
The present disclosure provides a method for manufacturing a resistor. The method may include providing a resistor structure having a layer of first thermally conductive material covering at least a surface of the resistive body, the first thermally conductive material being semi-cured, semi-hardened and substantially non-fluid, and the layer of first thermally conductive material having a first thickness; bending a pair of electrodes at the opposite ends of the resistive body toward a surface of the layer of first thermally conductive material; and pressing the pair of electrodes against the surface of the layer of first thermally conductive material, while maintaining in a heated state the first thermally conductive material to cause further curing and hardening of the first thermally conductive material and a reduction in the first thickness, so as to obtain a cured and hardened thermally conductive layer having a desired second thickness.
Public/Granted literature
- US20200312490A1 METHOD FOR MANUFACTURING RESISTOR, AND RESISTOR Public/Granted day:2020-10-01
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