- 专利标题: Method for defect inspection of transparent substrate by integrating interference and wavefront recording to reconstruct defect complex images information
-
申请号: US15590706申请日: 2017-05-09
-
公开(公告)号: US10976152B2公开(公告)日: 2021-04-13
- 发明人: Chau-Jern Cheng , Chin-Yu Liu , Xin-Ji Lai
- 申请人: National Taiwan Normal University
- 申请人地址: TW Taipei
- 专利权人: National Taiwan Normal University
- 当前专利权人: National Taiwan Normal University
- 当前专利权人地址: TW Taipei
- 代理机构: Muncy, Geissler, Olds and Lowe, P.C.
- 优先权: TW106100291 20170105
- 主分类号: G01B9/02
- IPC分类号: G01B9/02 ; G01B9/021 ; G03H1/04 ; G03H1/00
摘要:
A method for defect inspection of a transparent substrate comprises (a) providing an optical system for performing a diffraction process of object wave passing through a transparent substrate, (b) interfering and wavefront recording for the diffracted object wave and a reference wave to reconstruct the defect complex images (including amplitude and phase) of the transparent substrate, (c) characteristics analyzing, features classifying and sieving for the defect complex images of the transparent substrate, and (d) creating defect complex images database based-on the defect complex images for comparison and detection of the defect complex images of the transparent substrate.
公开/授权文献
信息查询