Invention Grant
- Patent Title: Semiconductor device
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Application No.: US16110136Application Date: 2018-08-23
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Publication No.: US10944015B2Publication Date: 2021-03-09
- Inventor: Masahiro Sugimoto , Isao Takahashi , Takashi Shinohe , Toshimi Hitora
- Applicant: FLOSFIA INC.
- Applicant Address: JP Kyoto
- Assignee: FLOSFIA INC.
- Current Assignee: FLOSFIA INC.
- Current Assignee Address: JP Kyoto
- Agency: Wenderoth, Lind & Ponack, L.L.P.
- Priority: JPJP2017-161676 20170824
- Main IPC: H01L29/868
- IPC: H01L29/868 ; H01L29/24 ; H01L29/06 ; H01L29/872 ; H01L21/02 ; H01L29/04 ; H01L29/66

Abstract:
In a first aspect of a present inventive subject matter, a semiconductor device includes an n-type semiconductor layer including a first semiconductor as a major component, an i-type semiconductor layer including a second semiconductor as a major component and a p-type semiconductor layer including a third semiconductor as a major component. The second semiconductor contains a corundum-structured oxide semiconductor.
Public/Granted literature
- US20190067492A1 SEMICONDUCTOR DEVICE Public/Granted day:2019-02-28
Information query
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