- 专利标题: Apparatus of plural charged-particle beams
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申请号: US16200421申请日: 2018-11-26
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公开(公告)号: US10811222B2公开(公告)日: 2020-10-20
- 发明人: Weiming Ren , Xuedong Liu , Xuerang Hu , Zhongwei Chen
- 申请人: ASML Netherlands B.V.
- 申请人地址: NL Veldhoven
- 专利权人: ASML Netherlands B.V.
- 当前专利权人: ASML Netherlands B.V.
- 当前专利权人地址: NL Veldhoven
- 代理机构: Finnegan, Henderson, Farabow, Garrett & Dunner LLP
- 主分类号: H01J37/28
- IPC分类号: H01J37/28 ; H01J37/14 ; H01J37/141 ; H01J37/29 ; H01J37/153 ; H01J37/20 ; H01J37/244
摘要:
A secondary projection imaging system in a multi-beam apparatus is proposed, which makes the secondary electron detection with high collection efficiency and low cross-talk. The system employs one zoom lens, one projection lens and one anti-scanning deflection unit. The zoom lens and the projection lens respectively perform the zoom function and the anti-rotating function to remain the total imaging magnification and the total image rotation with respect to the landing energies and/or the currents of the plural primary beamlets. The anti-scanning deflection unit performs the anti-scanning function to eliminate the dynamic image displacement due to the deflection scanning of the plural primary beamlets.
公开/授权文献
- US20190172677A1 APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS 公开/授权日:2019-06-06
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