- Patent Title: Semiconductor memory device and method of manufacturing the same
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Application No.: US16251337Application Date: 2019-01-18
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Publication No.: US10797071B2Publication Date: 2020-10-06
- Inventor: Jun Hyoung Kim , Kwang Soo Kim , Geun Won Lim
- Applicant: SAMSUNG ELECTRONICS CO., LTD.
- Applicant Address: KR Suwon-si, Gyeonggi-do
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Suwon-si, Gyeonggi-do
- Agency: Lee IP Law, P.C.
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@31274760
- Main IPC: H01L27/11582
- IPC: H01L27/11582 ; H01L27/11573 ; H01L27/1157 ; H01L23/522 ; H01L23/528 ; H01L27/11565 ; H01L21/28

Abstract:
A semiconductor memory device includes a peripheral circuit structure including a peripheral circuit insulating layer, a middle connection structure on the peripheral circuit insulating layer, the middle connection structure including a middle connection insulating layer, and a bottom surface of the middle connection insulating layer is in contact with a top surface of the peripheral circuit insulating layer, stack structures on sides of the middle connection structure, and channel structures extending vertically through each of the stack structures, wherein at least one side surface of the middle connection insulating layer is an inclined surface, a lateral sectional area of the middle connection insulating layer decreasing in an upward direction oriented away from the peripheral circuit insulating layer.
Public/Granted literature
- US20200020716A1 SEMICONDUCTOR MEMORY DEVICE AND METHOD OF MANUFACTURING THE SAME Public/Granted day:2020-01-16
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