Invention Grant
- Patent Title: High power electrostatic chuck with aperture-reducing plug in a gas hole
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Application No.: US15383124Application Date: 2016-12-19
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Publication No.: US10770270B2Publication Date: 2020-09-08
- Inventor: Jaeyong Cho , Haitao Wang , Vijay D. Parkhe , Kartik Ramaswamy , Chunlei Zhang
- Applicant: APPLIED MATERIALS, INC.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Schwabe, Williamson & Wyatt, P.C.
- Main IPC: H01L21/683
- IPC: H01L21/683 ; H01T23/00 ; H01J37/32 ; H01L21/67
Abstract:
An electrostatic chuck is described to carry a workpiece for processing such as high power plasma processing. In embodiments, the chuck includes a top plate to carry the workpiece, the top plate having an electrode to grip the workpiece, a cooling plate under the top plate to cool the top plate, a gas hole through the cooling plate and the top plate to feed a gas to the workpiece through the top plate, and an aperture-reducing plug in the cooling plate gas hole to conduct gas flow through the hole.
Public/Granted literature
- US20170352568A1 HIGH POWER ELECTROSTATIC CHUCK WITH APERTURE-REDUCING PLUG IN A GAS HOLE Public/Granted day:2017-12-07
Information query
IPC分类:
