Invention Grant
- Patent Title: Multi-layer plasma erosion protection for chamber components
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Application No.: US15965794Application Date: 2018-04-27
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Publication No.: US10755900B2Publication Date: 2020-08-25
- Inventor: Toan Tran , Laksheswar Kalita , Tae Won Kim , Dmitry Lubomirsky , Xiaowei Wu , Xiao-Ming He , Cheng-Hsuan Chou , Jennifer Y. Sun
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: APPLIED MATERIALS, INC.
- Current Assignee: APPLIED MATERIALS, INC.
- Current Assignee Address: US CA Santa Clara
- Agency: Lowenstein Sandler LLP
- Main IPC: C23C16/40
- IPC: C23C16/40 ; H01J37/32 ; C23C16/02 ; C23C28/04 ; C23C16/455 ; C23C16/04 ; C23C16/44 ; C23C24/04 ; C23C18/36 ; C25D7/12

Abstract:
A method of applying a multi-layer plasma resistant coating on an article comprises performing plating or ALD to form a conformal first plasma resistant layer on an article, wherein the conformal first plasma resistant layer is formed on a surface of the article and on walls of high aspect ratio features in the article. The conformal first plasma resistant coating has a porosity of approximately 0% and a thickness of approximately 200 nm to approximately 1 micron. One of electron beam ion assisted deposition (EB-IAD), plasma enhanced chemical vapor deposition (PECVD), aerosol deposition or plasma spraying is then performed to form a second plasma resistant layer that covers the conformal first plasma resistant layer at a region of the surface but not at the walls of the high aspect ratio features.
Public/Granted literature
- US20180330923A1 MULTI-LAYER PLASMA EROSION PROTECTION FOR CHAMBER COMPONENTS Public/Granted day:2018-11-15
Information query
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