A method for forming a wafer level chip scale package begins with providing an integrated circuit wafer. Applying a dielectric material to the surface of the integrated circuit wafer. A redistribution conductive layer is formed upon the dielectric material to make contact with the input/output contacts of the integrated circuit. A polymer-based film is applied to the surface of the integrated circuit wafer and is subjected to a compression molding process. Alignment marks are placed on the edge of the integrated circuit wafer. A laser ablation process is implemented to prepare through mold via (TMV) in the cured thermoset plastic material. The solder ball or copper pillar input/output connector is placed in the through mold via (TMV). A reflow process is instigated to connect the input/output connector to the redistribution conductive layer's pad surface.