- 专利标题： Reaction products of amine monomers and polymers containing saturated heterocyclic moieties as additives for electroplating baths
-
申请号： US15560228申请日： 2015-04-28
-
公开(公告)号： US10604856B2公开(公告)日： 2020-03-31
- 发明人: Lingli Duan , Chen Chen , Tong Sun , Zukhra I. Niazimbetova , Maria Anna Rzeznik
- 申请人： Dow Global Technologies LLC , Rohm and Haas Electronic Materials LLC
- 申请人地址： US MA Marlborough US MI Mid
- 专利权人： Rohm and Haas Electronics Materials LLC,Dow Global Technologies LLC
- 当前专利权人： Rohm and Haas Electronics Materials LLC,Dow Global Technologies LLC
- 当前专利权人地址： US MA Marlborough US MI Mid
- 代理商 John J. Piskorski
- 国际申请： PCT/CN2015/077683 WO 20150428
- 国际公布： WO2016/172852 WO 20161103
- 主分类号： C25D3/32
- IPC分类号： C25D3/32 ; C25D3/38 ; C25D3/58 ; C25D3/60 ; C08G73/10 ; C08G73/00 ; C25D3/30 ; C08K5/17 ; H05K3/24 ; C25D7/00
摘要：
Reaction products of amines and polymers containing saturated heterocyclic moieties may be used as levelers in metal electroplating baths. The reaction products may plate metal with good surface properties and good physical reliability.
公开/授权文献
信息查询
